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	<title><![CDATA[laser pulse Resources | ZDNet]]></title>
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		<title><![CDATA[Improving chip density by a factor of 100]]></title>
		<link><![CDATA[http://blogs.zdnet.com/emergingtech/?p=1074]]></link>
		<description><![CDATA[According to the semiconductor industry, maskless nanolithography is a flexible nanofabrication technique which suffers from low throughput. But now, engineers at the University of California at Berkeley have developed a new approach that involves 'flying' an array of plasmonic lenses just 20 nanometers above a rotating surface. With this approach,...]]></description>
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		<pubDate>Sun, 26 Oct 2008 09:32:07 -0700</pubDate>
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		<category domain="http://updates.zdnet.com/tags/roland+piquepaille.html"><![CDATA[Roland Piquepaille]]></category>
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